In semiconductor manufacturing, maintaining ultra-high purity
process gases is critical to prevent defects and ensure high
yields. 1μm metal filter media play a vital role in gas purification by
removing particulate contaminants while also contributing to
Airborne Molecular Contamination (AMC) control, which is essential
for advanced wafer fabrication.
Key Features & Benefits
High-Efficiency Filtration (1μm Retention)
Captures sub-micron particles that could cause defects in
photolithography, etching, and deposition processes.
Reduces risk of wafer surface contamination, improving yield.
Chemically Inert & Corrosion-Resistant
Made from high-purity stainless steel (316L), nickel, or sintered alloys for compatibility with aggressive gases (e.g., HF, HCl, NH₃).
Resists outgassing, preventing additional contamination.
AMC Control Capability
Some advanced metal filters incorporate surface treatments or coatings (e.g., passivation, electropolishing) to minimize
adsorption/desorption of volatile organics or acids.
Helps meet SEMI F21 AMC Class 1 requirements for sensitive processes like EUV lithography.
High Temperature & Pressure Resistance
Stable performance in harsh conditions (up to 500°C or higher for
some alloys).
Suitable for CVD, diffusion, and ion implantation gas lines.
Long Service Life & Cleanability
Reusable after cleaning (ultrasonic, chemical, or thermal methods),
reducing cost of ownership.
Low pressure drop design for energy-efficient gas flow.
Applications in Semiconductor Manufacturing
Ultra-high purity (UHP) gas delivery (N₂, Ar, H₂, O₂, etc.)
Etch & deposition processes (CVD, PVD, ALD)
Photolithography (AMC-sensitive EUV/DUV environments)
Bulk gas & point-of-use (PoU) filtration
Why Metal Filters Over Alternatives?
Superior durability vs. polymeric filters (which can degrade and shed particles).
No fiber shedding unlike traditional HEPA/ULPA filters.
Better AMC mitigation compared to standard particulate filters.
Compliance & Standards
SEMI F20 (Particulate Control)
SEMI F21 (AMC Classification)
ISO 14644-1 (Cleanroom Standards)
Conclusion
1μm metal filter media is a robust solution for semiconductor gas purification, combining particulate filtration, AMC control, and chemical resistance to meet the stringent demands of advanced wafer fabrication.
